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Dewey Decimal Number: 530.44 EAN: 9780471005773 Edition: 1 ISBN: 0471005770 Label: Wiley-Interscience Manufacturer: Wiley-Interscience Number Of Items: 1 Number Of Pages: 600 Publication Date: October 14, 1994 Publisher: Wiley-Interscience Studio: Wiley-Interscience Editorial Review: Product Description: Timely, authoritative, pedagogically consistent— a valuable professional resource and a superior didactic tool. Authored by two internationally respected pioneers in the field, this book offers a fully integrated, pedagogically consistent presentation of the fundamental physics and chemistry of partially ionized, chemically reactive, low-pressure plasmas and their roles in a wide range of plasma discharges and processes used in thin film processing applications—especially in the fabrication of integrated circuits. With many fully worked examples, practice exercises, and clear demonstrations of the relationship of plasma parameters to external control parameters and processing results, this book combines the best qualities of a student text and a professional resource.
Average Rating:
 Rating:  - outstanding plasma resourceOne of the most practical and comprehensive resources on plasma phyics and engineering. The book is much easier to understand and more in depth than most other books on the subject, except for maybe chen (who takes more of a physics approach, whereas lieberman takes more of an engineering approach) This book is a must have for anyone working with or studying plasmas. Rating:  - OverratedAs a praciticing process engineer my opinion is this book lacks insight. Typical text book written a professor in the academic community with no practical experience. This book spends far to much time deriving equations and not discussing the basics concepts. The author makes a half hearted attempt to relate the first 14 chapters to the real worl, in a short and inadequate Chapter 15. This is the first mail book order book i took the time to return. In all honesty this book is not worth the ... Read More Rating: - An excellent overview of common plasma processing devicesLieberman covers many of the standard processing devices and much of the physics needed to model them effectively. The presentation is clear and extremely useful both as a reference and as a tutorial. A must-have book for anyone interested in plasma processing. Rating: - The book provides an excellent overview of plasma processingThis book provides an excellent introduction and overview of plasma discharges applied to semiconductor manufacturing. It is well-organized, clearly-written and full of useful examples and exercises. And unlike many books on plasma physics, it is not overly-mathematical and contains many useful physical insights. I strongly recommend this book for anyone wanting to review the field of plasma processing. Rating: - Very Good Theoretical Coverage of Plasma's, including ECRThis book provides a theoretical overview of plasma's, including coverage of ECR applications. This was very valuable for Hitachi Etchers. The theory is presented at an undergraduate level and assumes the reader has knowledge of vector analysis. Highly recommended for any Etch Process Engineer in the Semiconductor Industry. |
